AURION supplies batch, cluster and inline systems for the treatment and coating of surfaces in plasma processes as well as high-frequency components.
The plasma technologies used include activation, cleaning and etching, reactive ion etching and microwave downstream plasma, coating with PVD (physical vapor deposition, sputtering) and PECVD (plasma-enhanced chemical vapor deposition).
The high-frequency components on offer include automatic impedance matching networks, filters, switches, power dividers, phase shifters, flexible connectors and much more.
In addition, the Aurion team offers its extensive expertise in plasma technology and high-frequency technology for consulting services and training. The in-house application laboratory can also be used for process development and sample production.
AURION offers the following services, among others: