FAP Plasma Technology

Thanks to our employees with many years of experience in the field of high-frequency technology, gas, measurement and control technology and technical plasma applications, we are able to offer our customers the best possible support through our efficient service and the sale of generators and adaptations of high-frequency power technology and gas flow controllers.

HF power supplies and MFCs are among the peripheral system components in the semiconductor process that directly determine the process. We ensure that these devices comply with the certificates, calibration curves or the manufacturer’s technical specifications by precisely matching them to the machine. The measurement protocols supplied support this process.

We endeavor to support our customers in solving their tasks within a response time of 24 hours and by providing comprehensive assistance. Direct communication with our business partners is particularly important to us.

Our know-how and expertise in the field of plasma chemical vapor deposition (plasma CVD) and plasma-assisted ALD/ALE (PEALD/PEALE) of thin films for optical, electronic and mechanical applications and our experience in handling hazardous gases are the result of many years of research and development in thin film technology, plasma and high-frequency technology. Plasma etching of coatings for defined surface properties is also part of our range of services. Close cooperation with our customers to realize efficient technologies for plasma-chemical surface treatment is a basic principle of our corporate concept.

Our network also includes cooperation with competent suppliers of vacuum thin-film technology systems and relevant system components, as well as close collaboration with research institutes and universities.