3rd International Conference on HIPIMS 2012 in Sheffield (UK)

The third edition of the International Conference on HIPIMS took place from the 19th to the 20th of June 2012. About 130 representatives from industry and research met in Sheffield, United Kingdom to discuss current developments on the subject of High Power Impulse Magnetron Sputtering (HIPIMS).

Renowned speakers and experts from 20 countrys have presented fields of application, current research results and trends in more than 40 lectures. A special highlight was the attending exhibition with many more notable actors of the HIPIMS-scene. The evening event at the historic Cutlers‘ Hall gave the conference participants the possiblity for intensive networking in a festive frame.

HIPIMS is a modern PVD technology which, through short high-energy pulses with capacities in the megawatt region, can produce very high high plasma densities. HIPIMS very suited for manufacturing for example of layers with high density, high refraction index and with extremely smooth surfaces for applications such as automotive- or semiconductor industry.

The next HIPIMS-Conference takes place on 12 and 13 June 2013 in Braunschweig.